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dc.contributor.authorRamos Murillo, Manuel Antonio
dc.date.accessioned2025-11-06T18:30:57Z
dc.date.available2025-11-06T18:30:57Z
dc.date.issued2024-03-26es_MX
dc.identifier.urihttps://cathi.uacj.mx/20.500.11961/31736
dc.description.abstractWe present the fabrication of a MoS2−xSex thin film from a co-sputtering process using MoS2 and MoSe2 commercial targets with 99.9% purity. The sputtering of the MoS2 and MoSe2 was carried out using a straight and low-cost magnetron radio frequency sputtering recipe to achieve a MoS2−xSex phase with x = 1 and sharp interface formation as confirmed by Raman spectroscopy, time-of-flight secondary ion mass spectroscopy, and cross-sectional scanning electron microscopy. The sulfur and selenium atoms prefer to distribute randomly at the octahedral geometry of molybdenum inside the MoS2−xSex thin film, indicated by a blue shift in the A1g and E1g vibrational modes at 355 cm−1 and 255 cm−1, respectively. This work is complemented by computing the thermodynamic stability of a MoS2− xSex phase whereby density functional theory up to a maximum selenium concentration of 33.33 at.% in both a Janus-like and random distribution. Although the Janus-like and the random structures are in the same metastable state, the Janus-like structure is hindered by an energy barrier below selenium concentrations of 8 at.%. This research highlights the potential of transition metal dichalcogenides in mixed phases and the need for further exploration employing low-energy, largescale methods to improve the materials’ fabrication and target latent applications of such structures.es_MX
dc.description.urihttps://www.nature.com/articles/s41598-024-57243-3#citeases_MX
dc.language.isoen_USes_MX
dc.relation.ispartofProducto de investigación IITes_MX
dc.relation.ispartofInstituto de Ingeniería y Tecnologíaes_MX
dc.rightsCC0 1.0 Universal*
dc.rights.urihttp://creativecommons.org/publicdomain/zero/1.0/*
dc.subjectMateriales, Peliculas, Semiconductores, Fisica, Quimica, MoS2es_MX
dc.subject.otherinfo:eu-repo/classification/cti/1es_MX
dc.titleOne-step sputtering of MoSSe metastable phase as thin film and predicted thermodynamic stability by computational methodses_MX
dc.typeArtículoes_MX
dcterms.thumbnailhttp://ri.uacj.mx/vufind/thumbnails/rupiiit.pnges_MX
dcrupi.institutoInstituto de Ingeniería y Tecnologíaes_MX
dcrupi.cosechableSies_MX
dcrupi.volumen14es_MX
dcrupi.nopagina1-11es_MX
dc.identifier.doihttps://doi.org/10.1038/s41598-024-57243-3es_MX
dc.journal.titleScientific Reportses_MX
dc.contributor.authorexternoLópez-Galán, Oscar Alberto
dc.contributor.coauthorexternoHeilmaier, Martin
dc.contributor.coauthorexternoWelle, Alexander
dc.contributor.coauthorexternoChassaing, Delphine
dc.contributor.coauthorexternoNogan, John
dc.contributor.coauthorexternoBoll, Torben
dcrupi.colaboracionextEstados Unidos de Americaes_MX
dcrupi.colaboracionextAlemaniaes_MX
dcrupi.vinculadoproyextCritical dimensions of MoS2, WS2 and WO3 thin films: Potential Photovoltaic Applications (RIPI2020IIT5)es_MX
dcrupi.pronacesEnergía y Cambio Climáticoes_MX


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