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dc.date.accessioned2021-06-09T17:44:20Z
dc.date.available2021-06-09T17:44:20Z
dc.date.issued2021-02-13es_MX
dc.identifier.urihttp://cathi.uacj.mx/20.500.11961/18464
dc.description.abstractThe effect of sputtering power (=60 W–180 W) on the electrochromic properties of nickel oxide films deposited on ITO-coated glass substrates by the radio frequency magnetron sputtering technique was investigated. Crystalline structure and morphology were assessed by X-ray diffraction and scanning electron microscopy, respectively. The effect of sputtering power on electrochromism of the samples was evaluated with chronoamperometry, cyclic voltammetry, and electrochemical impedance spectroscopy. We used LiClO in a propylene carbonate solution for Li insertion/extraction. The chemical composition of the samples before and after Li intercalation was analyzed by X-ray photoelectron spectroscopy (XPS). We observed the cubic phase of NiO with sputtering power mainly affecting crystallinity and grain size. These in turn affect the electrochromic properties. Coloration efficiency reduces from 24.4 cm2/As to (15.4, 13.7, 16.1) cm2/As, and the reversibility from 40% to 30% as sputtering power increases from 60 W to 180 W. The impedance spectra indicates that ion diffusion is larger for the film grown at 60 W and then goes down for the films deposited at higher sputtering powers. XPS analysis reveals that higher values of promote the formation of nickel hydroxides on the film surface. As a consequence of changes in crystallinity and morphology, the presence of nickel hydroxides increases showing that not only the electrochromic properties of the samples are affected by the sputtering power, but also their chemical composition.es_MX
dc.description.urihttps://www.sciencedirect.com/science/article/abs/pii/S0030402621002370es_MX
dc.language.isoen_USes_MX
dc.relation.ispartofProducto de investigación IITes_MX
dc.relation.ispartofInstituto de Ingeniería y Tecnologíaes_MX
dc.subject.otherinfo:eu-repo/classification/cti/7es_MX
dc.titleSputtering power e ects on the electrochromic properties of NiO lmses_MX
dc.typeArtículoes_MX
dcterms.thumbnailhttp://ri.uacj.mx/vufind/thumbnails/rupiiit.pnges_MX
dcrupi.institutoInstituto de Ingeniería y Tecnologíaes_MX
dcrupi.cosechableSies_MX
dcrupi.volumen231es_MX
dc.identifier.doihttps://doi.org/10.1016/j.ijleo.2021.166509es_MX
dc.contributor.coauthorPerez, Israel
dc.contributor.coauthorElizalde Galindo, Jose Trinidad
dc.contributor.coauthorFarias, Rurik
dc.contributor.coauthorCARRILLO FLORES, DIANA MARÍA
dc.contributor.coauthorEnriquez Carrejo, Jose Luis
dc.contributor.coauthorBurrola Gándara, Luis Andrés
dc.contributor.coauthorMani Gonzalez, Pierre Giovanni
dc.contributor.alumno183326es_MX
dc.journal.titleOptikes_MX
dc.lgacPROPIEDADES FÍSICAS DE MATERIALES NANOESTRUCTURADOS Y SUS APLICACIONESes_MX
dc.cuerpoacademicoFísica de Materialeses_MX
dc.contributor.authorexternoAbenuz Acuña, Juan Ruben
dc.contributor.coauthorexternoSosa, Victor
dc.contributor.coauthorexternoGamboa, Fidel


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