Design and Construction of a Compact Rotary Substrate Heater for Deposition Systems
Resumen
We have designed and constructed a compact rotary substrate heater for the temperature range of 25 °C to 700 °C. The
heater can be implemented in any deposition system where crystalline samples are needed. Its main function is to provide heat
treatment in situ during film growth. The temperature is monitored and controlled by a temperature controller coupled to a
type-K thermocouple. A heater case was designed to host a resistive element and at the same time allow the substrate holder to
freely rotate. Rotation is crucial not only for film homogeneity during deposition but also for the elimination of temperature
gradients on the substrate holder. To tolerate oxidizing and corrosive environments, the instrument was made of stainless steel,
which also works as a “coolant”, taking advantage of heat dissipation. The instrument performs well for long periods of time
with stable temperatures. We hope that this project is useful for laboratories wishing to have a compact rotary heater that meets
the requirements for crystal growth and film homogeneity